Equipment Glossary

Equipment Glossary

A, B, C, D, E, F, G, H, I, J, K, L, M, N, O, P, Q, R, S, T, U, V, W, X, Y, Z

A

Anisotropic Etching

B

C

clean Station Work Area (of lab)

D

diffusion process

device characterization

E

F

G

H

I

Impingement Rate

ion implantation

Isotropic Etching

J

K

L

M

measurement Area (of lab)

metalization Area (of lab)

metalization process

N

O

oxidation process

P

Photolithography

photolithography area (of lab)

photolithography process

R

S

substrate characterization

T

Threshold Voltage

U

V

W

wafer storage area

Y

Z